来源：U.S. Department of Commerce, Bureau of Industry and Security (BIS), Export Administration Regulations (EAR) Entity List and advanced computing/semiconductor manufacturing equipment rules (15 C.F.R. Parts 740, 742, 744).
荷兰与美国、日本共同实施跨境出口管制，限制极紫外（EUV）和先进深紫外（DUV）光刻系统等先进制造设备的流向特定主权司法管辖区和指定最终用户。
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证据编号：EVD-C001-D45-P01-S04-F02
证据地址：zerOOneSea/1Zterminal/e/Evidence/2026-11/EVD-C001-D45-P01-S04-F02.json
指纹：9f38a643f3907722...